The next generation of Mentor Graphics' optical-proximity correction (OPC) tool has arrived, bringing with it a number of innovations that result in improved simulation accuracy. The next generation ...
Venice, Florida — Gauda, Inc. has demonstrated a breakthrough technology that can significantly accelerate OPC (optical proximity correction) and OPV (optimal proximity verification). Gauda ...
Wilsonville, Ore.-based semiconductor design and verification tool supplier Mentor Graphics Corp. this week debuted its Calibre nmOPC, a third-generation optical proximity correction (OPC) tool that ...
(Nanowerk News) Led by Prof. Wei Yayi, a team of researchers from the University of Chinese Academy of Sciences (UCAS) has achieved a significant breakthrough in enhancing the final pattern fidelity ...
The next generation of Mentor Graphics' optical-proximity correction (OPC) tool has arrived, bringing with it a number of innovations that result in improved simulation accuracy. Calibre nmOPC is a ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results