The growing demand for heterogeneous integration is driven by the 5G market. This includes smartphones, data centers, servers, high-performance computing (HPC), artificial intelligence (AI) and ...

Advanced Semiconductor Device Lithography – what is going to happen next ? The noise and hype level around lithography these days is rather loud. At SPIE’s Advanced Lithography conference this year, a ...

To help chipmakers conquer the time-to-market yield challenges of 45nm chip manufacturing, including the ones associated with immersion lithography, KLA-Tencor Inc. is launching a new overlay ...

“In order to continue scaling devices to meet Moore's law, chip manufacturers are extending 193nm immersion lithography using multi-patterning techniques and are assessing non-traditional patterning ...

Building an integrated circuit (IC) requires various physical and chemical processes to be performed on a semiconductor (e.g., silicon) substrate. Millions of transistors can be fabricated and wired ...

VELDHOVEN, Netherlands--(BUSINESS WIRE)--ASML Holding NV (ASML) today announced three new extensions for its popular TWINSCAN NXT platform that improve imaging, overlay and productivity. The ...

Veldhoven, the Netherlands. ASML has announced the first shipment of its new TWINSCAN NXT:1980Di immersion lithography system to support increasingly demanding multiple-patterning performance ...

(Nanowerk News) Toshiba Corporation and the National Institute of Advanced Industrial Science and Technology (AIST) today announced joint development of a mask pattern optimizing technology that ...

August 26, 2014. Today, KLA-Tencor Corp. introduced the WaferSight PWG patterned wafer geometry measurement system, the LMS IPRO6 reticle pattern placement metrology system and the K-T Analyzer 9.0 ...

VELDHOVEN, the Netherlands, 29 September 2015 - ASML Holding NV (ASML) today announced the first shipment of its new TWINSCAN(TM) NXT:1980Di immersion lithography system to support increasingly ...